Multiscale Modeling of Chemical Vapor Deposition (CVD) Apparatus: Simulations and Approximations
نویسندگان
چکیده
منابع مشابه
Multiscale Modeling of Chemical Vapor Deposition (CVD) Apparatus: Simulations and Approximations
We are motivated to compute delicate chemical vapor deposition (CVD) processes. Such processes are used to deposit thin films of metallic or ceramic materials, such as SiC or a mixture of SiC and TiC. For practical simulations and for studying the characteristics in the deposition area, we have to deal with delicate multiscale models. We propose a multiscale model based on two different softwar...
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ژورنال
عنوان ژورنال: Polymers
سال: 2013
ISSN: 2073-4360
DOI: 10.3390/polym5010142